Gas Tholin From N₂:CH₄ (95:5) at 150 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 95:5 |
| Substrate | Si |
| Reference Temperature | 150 K |
| Wavenumber (cm⁻¹) | 6251.915 - 24968.166 |
| Wavelength (µm) | 0.401 - 1.6 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 95:5 ratio) gas precursors by pulsed DC plasma discharge (-700 V) at 150 K temperature and 30 mbar pressure in the COSmIC experimental setup at NASA Ames Research Center, Moffett Field, CA, USA.
Tholin sample deposited on silicon (Si) substrate. Film thickness of ~0.32 µm.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done at room temperature, in ambient air, by normal-incidence reflection spectroscopy from 400 to 1600 nm.
Error bars/uncertainties are provided in the downloadable data.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Sciamma-O'Brien, E., Roush, T. L., Rannou, P., Dubois, D. and Salama, F. (2023) 'First Optical Constants of Laboratory-generated Organic Refractory Materials (Tholins) Produced in the NASA Ames COSmIC Facility from the Visible to the Near Infrared (0.4-1.6 µm): Application to Titan's Aerosols', The Planetary Science Journal, 4:121, 11 pp.