Gas Tholin From N₂:CH₄ (95:5) at 300 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 95:5 |
| Substrate | Al-SiO₂ |
| Reference Temperature | 300 K |
| Wavenumber (cm⁻¹) | 11114.445 - 27005.86 |
| Wavelength (µm) | 0.37 - 0.9 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 95:5 ratio) gas precursors by RF plasma discharge at 300 K temperature and 0.9 mbar pressure in the PAMPRE experimental setup at Laboratoire ATMosphère Observations Spatiales (LATMOS), Guyancourt, France.
Tholin sample deposited on a substrate covered with aluminum and quartz layers (Al-SiO₂). Film thickness of ~420 nm.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done at room temperature, in ambient air, by spectroscopic ellipsometry from 0.37 to 0.9 µm.
Error bars/uncertainties are provided in the downloadable data.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Sciamma-O'Brien, E., Dahoo, P.-R., Hadamcik, E., Carrasco, N., Quirico, E., Szopa, C. and Cernogora, G. (2012) 'Optical constants from 370 nm to 900 nm of Titan tholins produced in a low pressure RF plasma discharge', Icarus, 218, pp. 356-363.