Gas Tholin From N₂:CH₄ (98:2) at 300 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 98:2 |
| Substrate | SiO₂ |
| Reference Temperature | 300 K |
| Wavenumber (cm⁻¹) | 10000 - 50125.313 |
| Wavelength (µm) | 0.2 - 1 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 98:2 ratio) gas precursors by DC plasma discharge at 300 K temperature and 1 mbar pressure at Laboratoire Interuniversitaire des Systèmes Atmosphériques (LISA), Créteil, France.
Tholin sample deposited on quartz (SiO₂) substrate. Film thicknesses of ~3 and ~4 µm.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done at room temperature, in ambient air, by transmission and reflection spectroscopy from 200 to 1000 nm.
Error bars/uncertainties are provided in the downloadable data.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Ramírez, S. I., Coll, P., da Silva, A., Navarro-González, R., Lafait, J. and Raulin, F. (2002) 'Complex Refractive Index of Titan's Aerosol Analogues in the 200-900 nm Domain', Icarus, 156, pp. 519-529.