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Gas Tholin From CH₄:H₂:N₂ (0.000002:0.9929:0.007) at 300 K


Gas Tholin Datasets
Description
Sample Type Gas Tholin
Components CH₄:H₂:N₂
Ratio 0.000002:0.9929:0.007
Substrate SiO₂ and CsI
Reference Temperature 300 K
Wavenumber (cm⁻¹) 10000 - 28571.429
Wavelength (µm) 0.35 - 1

Uranus and Neptune gas tholin sample produced from methane:hydrogen:nitrogen (CH₄:H₂:N₂ with a 0.000002:0.9929:0.007 ratio) gas precursors by RF plasma discharge at 300 K temperature and 0.66 mbar pressure at Laboratory for Planetary Studies, Cornell University, Ithaca, NY, USA.

Tholin samples deposited on glass (SiO₂) and cesium iodide (CsI) substrates. Film thicknesses of 4 and 5 μm at measurement locations.

The imaginary part (k) of the complex index of refraction was determined from optical measurements done at room temperature, by transmission spectroscopy from 0.35 to 1.0 µm.

More information can be found in the publication and on the OCdb contributor's page.

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k

References

Any use of this data should recognize the parent publication(s):

Khare, B. N., Sagan, C., Thompson, W. R., Arakawa, E. T. and Votaw, P. (1987) 'Solid Hydrocarbon Aerosols Produced in Simulated Uranian and Neptunian Stratospheres', Journal of Geophysical Research, 92:A13, pp. 15067-15082.

k Values