Gas Tholin From N₂:CH₄ (90:10) at 300 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 90:10 |
| Substrate | SiO₂, CaF₂, LiF, and CsI |
| Reference Temperature | 300 K |
| Wavenumber (cm⁻¹) | 10.87 - 483091.787 |
| Wavelength (µm) | 0.021 - 920 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 90:10 ratio) gas precursors by DC plasma discharge at 300 K temperature and 0.2 mbar pressure at Oak Ridge National Laboratory, Oak Ridge, TN, USA.
Tholin samples deposited on quartz (SiO₂), calcium fluoride (CaF₂), lithium fluoride (LiF) and cesium iodide (CsI) substrates. Film thicknesses ranging from ~0.6 to ~20 μm.
Tholin samples produced as spherical particles and pressed as pellets at 1700 bar, with thicknesses ranging from 0.31 to 0.810 mm.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done at room temperature, by a combination of transmission, specular reflection, interferometric, Brewster angle and ellipsometric polarization techniques from 0.0207 to 920.0 μm.
The accuracy of the n index is estimated at ± 3%. The accuracy of the k index is estimated at ± 30%.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Khare, B. N., Sagan, C., Arakawa, E. T., Suits, F., Callcott, T. A. and Williams, M. W. (1984) 'Optical Constants of Organic Tholins Produced in a Simulated Titanian Atmosphere: From Soft X-Ray to Microwave Frequencies', Icarus, 60, pp. 127-137.