Gas Tholin From N₂:CH₄ (90:10) at 300 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 90:10 |
| Substrate | KBr, CaF₂ or SiO₂ |
| Reference Temperature | 300 K |
| Wavenumber (cm⁻¹) | 400 - 4000 |
| Wavelength (µm) | 2.5 - 25 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 90:10 ratio) gas precursors by RF plasma discharge at 300 K temperature and 0.26 mbar pressure at NASA Ames Research Center, Moffett Field, CA, USA.
Tholin samples deposited on potassium bromide (KBr), calcium fluoride (CaF₂) or quartz (SiO₂) substrates. Film thicknesses ranging from 0.5 to 7 µm.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done at room temperature, by infrared transmission and reflection spectroscopy from 2.5 to 25 µm.
Error bars/uncertainties are provided in the downloadable data.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Imanaka, H., Cruikshank, D. P., Khare, B. N. and McKay, C. P. (2012) 'Optical constants of Titan tholins at mid-infrared wavelengths (2.5-25 µm) and the possible chemical nature of Titan's haze particles', Icarus, 218, pp. 247-261.