Gas Tholin From N₂:CH₄ (95:5) at 100 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 95:5 |
| Substrate | SiO₂ |
| Reference Temperature | 100 K |
| Wavenumber (cm⁻¹) | 2850.635 - 24996.251 |
| Wavelength (µm) | 0.4 - 3.508 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 95:5 ratio) gas precursors by AC plasma discharge at 100 K temperature and 2 Torr pressure in the PHAZER experimental setup at Johns Hopkins University, Baltimore, MD, USA.
Tholin sample deposited on quartz (SiO₂) substrate. Film thickness of 1.219 µm.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done at a temperature of 300 K and a pressure < 0.2 mbar, by vacuum transmission and reflection spectroscopy from 0.4 to 3.5 µm with a resolution of 2 cm⁻¹.
The accuracy of the n index is estimated at ± 4% or less at λ > 1.5 µm and ± 5-14% at λ < 1.5 µm. The accuracy of the k index is estimated at ± 3-6% at λ > 1.5 µm and ± 10% at λ < 1.5 µm.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
He, C., Hörst, S. M., Radke, M. and Yant, M. (2022) 'Optical Constants of a Titan Haze Analog from 0.4 to 3.5 µm Determined Using Vacuum Spectroscopy', The Planetary Science Journal, 3:25, 9 pp.