Gas Tholin From N₂:CH₄ (90:10) at 200 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 90:10 |
| Substrate | Single-polished Si (for the Vis-NIR region) and double-polished Si (for the IR region) |
| Reference Temperature | 200 K |
| Wavenumber (cm⁻¹) | 49.899 - 25012.506 |
| Wavelength (µm) | 0.4 - 200.404 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 90:10 ratio) gas precursors by pulsed DC plasma discharge at ~200 K temperature and 30 hPa pressure in the COSmIC experimental setup at NASA Ames Research Center, Moffett Field, CA, USA.
Tholin sample deposited on single-polished and double-polished silicon (Si) substrates. Film thicknesses varying between ~990 and ~1134 nm on the Si substrates.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done by reflection spectroscopy at atmospheric pressure and temperature from 0.4 to 1.6 µm, and by transmission spectroscopy at room temperature and under vacuum from 1.5 to 200 µm.
Error bars/uncertainties are provided in the downloadable data.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Drant, T., Sciamma-O'Brien, E., Jovanovic, L., Perrin, Z., Maratrat, L., Vettier, L., Garcia-Caurel, E., Brubach, J.-B., Wooden, D. H., Roush, T. L., Ricketts, C. L. and Rannou, P. (2026) 'Refractive indices of photochemical haze analogs for Solar System and exoplanet applications: A cross-laboratory comparative study between the PAMPRE and COSmIC experimental setups', Astronomy & Astrophysics, 706, A167.