Gas Tholin From N₂:CH₄ (90:10) at 298 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N₂:CH₄ |
| Ratio | 90:10 |
| Substrate | MgF₂ (for the UV-Vis-NIR region) and Si (for the IR region) |
| Reference Temperature | 298 K |
| Wavenumber (cm⁻¹) | 49.899 - 33333.333 |
| Wavelength (µm) | 0.3 - 200.404 |
Titan gas tholin sample produced from nitrogen:methane (N₂:CH₄ with a 90:10 ratio) gas precursors by RF plasma discharge at ~298 K temperature and 0.9 hPa pressure in the PAMPRE experimental setup at Laboratoire ATMosphère Observations Spatiales (LATMOS), Guyancourt, France.
Tholin sample deposited on magnesium fluoride (MgF₂) and silicon (Si) substrates. Film thicknesses of ~1740 nm on the MgF₂ substrate and ~1822 nm on the Si substrate.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done by transmission spectroscopy at atmospheric pressure and temperature from 0.3 to 2.5 µm, and at room temperature and under vacuum from 1.5 to 200 µm.
Error bars/uncertainties are provided in the downloadable data.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Drant, T., Sciamma-O'Brien, E., Jovanovic, L., Perrin, Z., Maratrat, L., Vettier, L., Garcia-Caurel, E., Brubach, J.-B., Wooden, D. H., Roush, T. L., Ricketts, C. L. and Rannou, P. (2026) 'Refractive indices of photochemical haze analogs for Solar System and exoplanet applications: A cross-laboratory comparative study between the PAMPRE and COSmIC experimental setups', Astronomy & Astrophysics, 706, A167.