Gas Tholin From N2:CH4:CO (94.95:5:0.05) at 300 K
| Sample Type | Gas Tholin |
|---|---|
| Components | N2:CH4:CO |
| Ratio | 94.95:5:0.05 |
| Substrate | Si |
| Reference Temperature | 300 K |
| Wavenumber (cm⁻¹) | 4761.905 - 37037.037 |
| Wavelength (µm) | 0.27 - 2.1 |
Pluto gas tholin sample produced from nitrogen:methane:carbon monoxide (N2:CH4:CO with a 94.95:5:0.05 ratio) gas precursors by RF plasma discharge at 300 K temperature and 0.9 mbar pressure in the PAMPRE experimental setup at Laboratoire ATMosphère Observations Spatiales (LATMOS), Guyancourt, France.
Tholin sample deposited on silicon (Si) substrate. Film thickness of ~651.0 nm.
The real (n) and imaginary (k) parts of the complex index of refraction were determined from optical measurements done at room temperature, in ambient air, by spectroscopic ellipsometry from 270 to 2100 nm.
Error bars/uncertainties are provided in the downloadable data.
More information can be found in the publication and on the OCdb contributor's page.
Any use of this data should recognize the parent publication(s):
Jovanović, L., Gautier, T., Broch, L., Protopapa, S., Bertrand, T., Rannou, P., Fayolle, M., Quirico, E., Johann, L., En Naciri, A. and Carrasco, N. (2021) 'Optical constants of Pluto aerosol analogues from UV to near-IR', Icarus, 362, 114398.